针对离子注入装置、我社敬备以下主要气体。

We supply the following gases for ion implantation:

以下气体以外，特殊的材料、流体、固体也可根据要求配制。

We also supply special materials not listed below, and materials in liquid or solid forms upon request.

高千穂所制造离子注入装置用气体一览表
Table of Ion Implantation Gases Manufactured at Takachiho

容器种类 Cylinder Size	气体的种类 Gas or Mixture	充填压力 Filling Pressure	容量 Contents	容器阀门形状 Valve Type	出口 尺寸 Outlet Size
0.35L	AsH3 15%+H2	4.91MPa	17.5L	隔膜阀 直通式(SUS) Diaphragm Valve Straight Type	1/4PF (阳) 19旋 19h male
	PH3 15%+H2	4.91MPa	17.5L
	PH3 15%+He	4.91MPa	17.5L
	BF3	7.36MPa	100g
	SiF4	4.91MPa	100g
	Ar	4.91MPa	17.5L
1L	AsH3 15%+H2	4.91MPa	50L	隔膜阀 角式(SUS) Diaphragm Valve Angle Type	22mm (阳) 左14旋 14h left male 22mm 14 (阳) 右14旋 14h right male
	PH3 15%+H2	4.91MPa	50L
	BF3	5.40MPa	200ｇ
	11BF3	2.95MPa	100g
	Ar	4.91MPa	50L	杆式阀 角式 Spindle Valve Angle Type
3.4L	AsH3 15%+H2	4.91MPa	170L	隔膜阀 直通式(B) Diaphragm Valve Angle Type	22mm (阳) 左14旋 14h left male 22mm (阳) 右14旋 14h right male
	PH3 15%+H2	4.91MPa	170L
	BF3	2.75MPa	300g	隔膜阀 角式(SUS Diaphragm Valve Angle Type
	11BF3	1.97MPa	200g
	Ar	4.91MPa	170L	杆式阀 (内蔵过滤器) Spindle Valve Angle Type	22mm (阳) 右14旋 14h right male
其他的 气体材料 Others	BCL3, Xe, Ne, O2, PF3, N2, CO2, B2H6 15%+H2, GeH4, AsH3, PH3
SDS®	AsH3　100％	21℃ 650±50Torr	4×440ｇ 7×88ｇ	隔膜式 (内蔵过滤器) Diaphragm (Ｉｎｔｅｒｎａｌ　Filter)	(阳) 1/2"VCR 1/2"VCR male
	PH3　100%		4×170ｇ 7×30ｇ
	11BF3　100%		4×130ｇ 7×26ｇ		(阳)1/4"VCR 1/4"VCR male

注释) SDS 4X＝2.25L　SDS 7X＝0.44L容器。
Note) SDS 4X = 2.25L, SDS 7X = 0.44L cylinder.
SDS是MATHESON TRI・GAS和Advanced Technology Materials, Inc.的注册商标。
SDS is a registered trade mark of MATHESON TRI・GAS and Advanced Technology Materials, Inc.

以上的气体以外，也请询问。注释) SDS 4X＝2.25L　SDS 7X＝0.44L容器。
Please inquire about other gases not listed above

离子注入相关装置

Ion Implantation Related Services

1. 也进行气体管道铺设的工程、改造工程、容器装设工作和管理。
2. 也办理特殊配管和认定零部件。
3. 为了确保您的安全，对0.35L、1L尺寸的容器，我们提供如右下边照片图的专用盒子。

1. We install gas piping and tubings, perform alterations, cylinder changes, and maintenance.
2. We also accept special piping and tubing requests, and carry regulatory certified parts.
3. For your safety, we provide our 0. 35L and 1L cylinders in special boxes as seen in the picture on the right.

使用离子注入装置材料气体的注意事项。

Notes on using ion implantation gases

1. 至于离子注入装置所使用的材料气体，多属毒性,腐蚀性,可燃性气体，必需事先充分掌握气体的特殊性以及紧急时刻的对应措施。
   请参考"物质安全数据表(MSDS)。
2. 请准备好空气面具等保护呼吸的器具。
3. 请务必安装所有必要的检漏仪。
4. 离子注入装置所使用的特殊气体多数具有高度毒性，必需具备废气装置。
5. 离子注入装置通常要求高真空。被使用的气体不管是高压气体，还是其他气体，都需要真空检漏测验,和加压检漏测验的双项测验。
6. 请使用氦气检漏仪进行真空测试。压力检测请使用N2或其他惰性气体，并且确认各连接部的密封性。
7. 每日检查压力调整器的刻度的减少,以及进行泄漏检查，包括检漏放置测验和检查压力调整器表的变动。

1. Material gas used for ion implantation is commonly poisonous, corrosive, and flammable.
   A thorough knowledge of the gases’ characteristics and emergency care are needed before use. Please refer to the appropriate Material Safety Data Sheet for details.
2. Please have air masks and other breathing protection apparatus ready at all times.
3. Please be sure to install all the necessary leak detectors.
4. Gas treatment and abatement systems are necessary due to the highly poisonous nature of most ion implantation gases.
5. Ion implantation equipment normally requires high vacuum. Regardless of the pressure of gases used (be it high pressure or atmospheric pressure), leak test of both types―vacuum test and pressure test―are necessary.
6. Please use helium leak detector for vacuum tests. Please use N2 or other inert gases for pressure tests, and confirm air tightness of all connections and joints.
7. Daily readings of regulator gauges, and regulator performance checks including leak tests and gauge performance tests are very important.